Deep reactive ion etching (DRIE) is a highly anisotropic plasma etching process that creates deep, near-vertical features in silicon and related microfabrication materials. DRIE extends ordinary ...

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

The semiconductor industry is one of the most advanced and complex in the world. The semiconductor industry relies on highly specialized supply chains and manufacturing equipment. This ecosystem ...

A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...

Researchers made nanoporous SiO2 coatings for ultraviolet laser optics, achieving uniform large area films and higher damage ...

For maximum resolution in a scanning tunneling microscope (STM), an extremely sharp metallic tip is required, which serves as the point through which the STM “scans” a sample. A blunt tip reduces STM ...

As any good metallurgist will tell you, you can't just take any two types of metal and weld them together. You may instead be able to just join them together with glue, however, thanks to research ...